Indispensable for Semiconductor Surface Cleaning
The Ministry of Environment held a groundbreaking ceremony for an ultrapure water demonstration plant at an SK Siltron plant on Nov. 16.
The new plant is for the ministry and companies in the industry to domestically develop various technologies related to high-purity industrial water by 2025, examples of which include UV oxidation systems for ultra-low concentration organic removal, degassing membranes for dissolved oxygen removal, and high-purity industrial water equipment design and construction. The demonstration plant will be built in the plant of the semiconductor material manufacturer so that ultrapure water production can be expedited and related technologies can be tested with ease.
The companies including the Korea Water Resources Corp. are aiming to produce 2,400 tons of ultrapure water a day. In addition, they are aiming to reduce their import dependence to 0 percent when it comes to production process design and operation and 40 percent when it comes to technology and equipment procurement.
Ultrapure water is indispensable for semiconductor surface cleaning. Ultrapure water production requires the highest level of water treatment as an organic content of 0.01 ppm or less is required to be maintained in the water. South Korean semiconductor companies have been reliant on ultrapure water imported from Japan and France.
The global high-purity industrial water market, which is related to electronics, pharmaceutical, steel and so on as well as the semiconductor sector, is expected to grow to 23 trillion won in 2024. The ultrapure water market related to the semiconductor sector is estimated to reach 4.4 trillion won that year.