An Essential Component of Photoresist for EUV Lithography

Photoresist for use in EUV lithography

Chemtronics announced on Feb. 7 that it succeeded in producing propylene glycol methyl ether acetate (PGMEA) with a purity of 99.999 percent. The substance is an essential component of photoresist for use in semiconductor and display manufacturing processes based on extreme ultraviolet (EUV) lithography.

PGMEA is also used in producing general chemical products such as paints and adhesives. At present, only Dow and LyondellBasell are capable of manufacturing PGMEA on their own.

As mentioned above, PGMEA with a purity of 99.999 percent is an essential component of photoresists, which have been subject to Japan’s export restrictions against South Korea since July 2019. Previously, South Korea imported PGMEA from Japan and China and the substance was supplied to South Korean companies after refinement at Chemtronics.
 

“PGMEA is one of the most difficult parts of EUV lithography and the production at Chemtronics is highly meaningful in terms of import replacement and competitive edge in the field of semiconductor material manufacturing,” said an industry source.

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